Influence of the Illumination Source on Model-Based SRAF PlacementGUPTA, Rachit; DAVE, Aasutosh; TEJNIL, Edita et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731U.1-79731U.8, 2Conference Paper

Comparison of Rule-based versus Model-based Decomposition TechniqueLACOUR, Pat; DAVE, Aasutosh; CHOU, Dyiann et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752011.1-752011.5Conference Paper

Pushing the limits of RET with different illumination optimization methodsDAVE, Aasutosh D; KIM, Ryoung-Han.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741C.1-72741C.9, 2Conference Paper

Towards the Prediction of Pattern Collapse Hotspots for FullChip LayoutsSTURTEVANT, John L; DAVE, Aasutosh; HOLLERBACH, Uwe et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663Y.1-81663Y.8, 2Conference Paper

Applicability of Global Source Mask Optimization to 22/20nm Node and BeyondKEHAN TIAN; FAKHRY, Moutaz; WEI, Alexander et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79730C.1-79730C.12, 2Conference Paper

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; SHINDO, Hiroyuki; HOJYO, Yutaka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661S.1-81661S.9, 2Conference Paper

Demonstrating the Benefits of Source-Mask Optimization and Enabling Technologies through Experiment and SimulationsMELVILLE, David; ROSENBLUTH, Alan E; CORLISS, Daniel et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764006.1-764006.18, 2Conference Paper

Impact of Illumination on Model -Based SRAF Placement for Contact PatterningSTURTEVANT, John L; JAYARAM, Srividya; EL-SEWEFY, Omar et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764036.1-764036.6, 2Conference Paper

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; HOJYO, Yutaka; SHINDO, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7971, issn 0277-786X, isbn 978-0-8194-8530-4, 79712G.1-79712G.9, 2Conference Paper

22 nm technology node active layer patterning for planar transistor devicesKIM, Ryoung-Han; HOLMES, Steven; HALLE, Scott et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72742X.1-72742X.6, 2Conference Paper

Micromachined infrared sensors with device-level encapsulationDAVE, Aasutosh; CELIK-BUTLER, Zeynep; BUTLER, Donald P et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 460-469, issn 0277-786X, isbn 0-8194-5768-X, 2Vol, 10 p.Conference Paper

Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometryDAVE, Aasutosh D; KRITSUN, Oleg; YUNFEI DENG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 727415.1-727415.9, 2Conference Paper